Scanning Hall probe measurements of field distributions of a coated conductor under applied fields

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dc.contributor.authorYoo, Jko
dc.contributor.authorJung, YWko
dc.contributor.authorLee, Jko
dc.contributor.authorLim, Sko
dc.contributor.authorLee, Sko
dc.contributor.authorJung, YHko
dc.contributor.authorYoum, Do-Junko
dc.contributor.authorKim, Hko
dc.contributor.authorHa, Hko
dc.contributor.authorOh, Sko
dc.date.accessioned2013-03-07T07:32:06Z-
dc.date.available2013-03-07T07:32:06Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2006-12-
dc.identifier.citationSUPERCONDUCTOR SCIENCE & TECHNOLOGY, v.19, pp.1291 - 1296-
dc.identifier.issn0953-2048-
dc.identifier.urihttp://hdl.handle.net/10203/89705-
dc.description.abstractWe measured the field profiles near the surface of a coated conductor ( CC) under various applied fields by using the scanning Hall probe method. The field, applied in the normal direction, was increased from zero to 171.5 Oe and then decreased to -58.8 Oe. We could not analyse our data completely by the direct use of Brandt's calculation but by a modification with unusual field dependences of the introduced parameters. Since Brandt's original calculation was based on homogeneous films, it was not suitable for CCs with coarse granular structures. The modified calculations with appropriate parameters are related to the coarse granular structures. Those parameters, D, J(c), and R, represent the three characteristics of the flux penetration network: the average distance of flux penetrations, the density of critical sheet currents, and the range of meandering of the flux penetration front, respectively. The external field dependences of these parameters were different from those of the classical critical state model.-
dc.languageEnglish-
dc.publisherIOP PUBLISHING LTD-
dc.subjectFLUX-PENETRATION-
dc.subjectMICROSCOPY-
dc.subjectSTRIP-
dc.titleScanning Hall probe measurements of field distributions of a coated conductor under applied fields-
dc.typeArticle-
dc.identifier.wosid000242622000013-
dc.identifier.scopusid2-s2.0-33846052682-
dc.type.rimsART-
dc.citation.volume19-
dc.citation.beginningpage1291-
dc.citation.endingpage1296-
dc.citation.publicationnameSUPERCONDUCTOR SCIENCE & TECHNOLOGY-
dc.identifier.doi10.1088/0953-2048/19/12/013-
dc.contributor.localauthorYoum, Do-Jun-
dc.contributor.nonIdAuthorYoo, J-
dc.contributor.nonIdAuthorJung, YW-
dc.contributor.nonIdAuthorLee, J-
dc.contributor.nonIdAuthorLim, S-
dc.contributor.nonIdAuthorLee, S-
dc.contributor.nonIdAuthorJung, YH-
dc.contributor.nonIdAuthorKim, H-
dc.contributor.nonIdAuthorHa, H-
dc.contributor.nonIdAuthorOh, S-
dc.type.journalArticleArticle-
dc.subject.keywordPlusFLUX-PENETRATION-
dc.subject.keywordPlusMICROSCOPY-
dc.subject.keywordPlusSTRIP-
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