DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박상후 | ko |
dc.contributor.author | 양동열 | ko |
dc.contributor.author | 임태우 | ko |
dc.date.accessioned | 2013-03-06T14:09:46Z | - |
dc.date.available | 2013-03-06T14:09:46Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-03 | - |
dc.identifier.citation | 한국정밀공학회지, v.23, no.3, pp.156 - 162 | - |
dc.identifier.issn | 1225-9071 | - |
dc.identifier.uri | http://hdl.handle.net/10203/87201 | - |
dc.description.abstract | Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated. | - |
dc.language | Korean | - |
dc.publisher | 한국정밀공학회 | - |
dc.title | 나노 스테레오리소그래피 공정을 이용한 무마스크 나노패턴제작에 관한 연구 | - |
dc.title.alternative | Investigation into direct Fabrication of nano-sterolithography (NSL) Process | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 23 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 156 | - |
dc.citation.endingpage | 162 | - |
dc.citation.publicationname | 한국정밀공학회지 | - |
dc.identifier.kciid | ART001098214 | - |
dc.contributor.localauthor | 양동열 | - |
dc.contributor.nonIdAuthor | 박상후 | - |
dc.contributor.nonIdAuthor | 임태우 | - |
dc.subject.keywordAuthor | Two-Photon Polymerization (이광자 흡수 광중합) | - |
dc.subject.keywordAuthor | Nano Stereolithography (나노 스테레오리소그래피 공정) | - |
dc.subject.keywordAuthor | Nano Patterns (나노 패턴) | - |
dc.subject.keywordAuthor | High-aspect-ratio Patterns (고세장비 패턴) | - |
dc.subject.keywordAuthor | Two-Photon Polymerization (이광자 흡수 광중합) | - |
dc.subject.keywordAuthor | Nano Stereolithography (나노 스테레오리소그래피 공정) | - |
dc.subject.keywordAuthor | Nano Patterns (나노 패턴) | - |
dc.subject.keywordAuthor | High-aspect-ratio Patterns (고세장비 패턴) | - |
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