DC Field | Value | Language |
---|---|---|
dc.contributor.author | Bai, KH | ko |
dc.contributor.author | You, SJ | ko |
dc.contributor.author | Chang, Hong-Young | ko |
dc.contributor.author | Uhm, HS | ko |
dc.date.accessioned | 2013-03-04T20:27:35Z | - |
dc.date.available | 2013-03-04T20:27:35Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2002-06 | - |
dc.identifier.citation | PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838 | - |
dc.identifier.issn | 1070-664X | - |
dc.identifier.uri | http://hdl.handle.net/10203/84017 | - |
dc.description.abstract | The electron energy distribution functions and plasma parameters in various gas mixture discharges (N-2,O-2,CF4/He,Ar,Xe) are measured. When He is mixed, the electron temperature increases but the electron density is almost constant. The electron temperature increases rapidly near a He mixing ratio of 1, but it is almost constant when the mixing ratio is small. In Ar mixture discharge, the electron temperature is almost constant; the electron density increases rapidly near a mixing ratio of 1, but increases slightly when the mixing ratio is small. Mixing Xe increases the electron density and decreases the electron temperature. The electron density varies in a similar way with that of the Ar mixing case. A simple two-ion-species global model is used to analyze the plasma parameter variations as a function of mixing ratio, and it agrees well with the experimental results. (C) 2002 American Institute of Physics. | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | CYCLOTRON-RESONANCE PLASMA | - |
dc.subject | TEMPERATURE CONTROL | - |
dc.subject | GRID SYSTEM | - |
dc.subject | DISCHARGE | - |
dc.subject | BIAS | - |
dc.title | Plasma parameters analysis of various mixed gas inductively coupled plasmas | - |
dc.type | Article | - |
dc.identifier.wosid | 000175745400048 | - |
dc.identifier.scopusid | 2-s2.0-0036607780 | - |
dc.type.rims | ART | - |
dc.citation.volume | 9 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 2831 | - |
dc.citation.endingpage | 2838 | - |
dc.citation.publicationname | PHYSICS OF PLASMAS | - |
dc.contributor.localauthor | Chang, Hong-Young | - |
dc.contributor.nonIdAuthor | Bai, KH | - |
dc.contributor.nonIdAuthor | You, SJ | - |
dc.contributor.nonIdAuthor | Uhm, HS | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | CYCLOTRON-RESONANCE PLASMA | - |
dc.subject.keywordPlus | TEMPERATURE CONTROL | - |
dc.subject.keywordPlus | GRID SYSTEM | - |
dc.subject.keywordPlus | DISCHARGE | - |
dc.subject.keywordPlus | BIAS | - |
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