DC Field | Value | Language |
---|---|---|
dc.contributor.author | Toivola, Y | ko |
dc.contributor.author | Kim, S | ko |
dc.contributor.author | Cook, RF | ko |
dc.contributor.author | Char, K | ko |
dc.contributor.author | Lee, JK | ko |
dc.contributor.author | Yoon, DY | ko |
dc.contributor.author | Rhee, HW | ko |
dc.contributor.author | Kim, Sang Youl | ko |
dc.contributor.author | Jin, MY | ko |
dc.date.accessioned | 2013-03-04T18:04:14Z | - |
dc.date.available | 2013-03-04T18:04:14Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-03 | - |
dc.identifier.citation | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.3, pp.F45 - F53 | - |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.uri | http://hdl.handle.net/10203/83553 | - |
dc.description.abstract | Porous copolymer films were synthesized from a methylsilsequioxane: 1,2-bis(trimethoxysilyl)ethane (MSSQ: BTMSE) matrix and either an aromatic-core or aliphatic-core porogen at 10, 20, or 30 wt % porogen loading. Films were characterized using scanning electron microscopy (SEM), IR spectroscopy, and ellipsometry. Depth-sensing indentation experiments were performed to measure apparent film modulus, E-f', and hardness, H. Indentation load-displacement traces and SEM images were used to determine the threshold load for cracking, P-c. The aliphatic-core porogen produced a greater porosity film than the aromatic-core porogen for 10 wt % loading and smaller porosity films for 20 and 30 wt % loadings. IR spectra, normalized for film thickness and density, indicated decreased O-Si-O networking in porous MSSQ: BTMSE films. The combination of increased porosity and decreased O-Si-O networking led to a decreased apparent E-f' and H relative to the unmodified MSSQ: BTMSE film. However, low-porosity (approximately 7%), aliphatic-porogen MSSQ: BTMSE films are optimized relative to unmodified MSSQ with smaller dielectric constant and greater E-f' and H. (C) 2004 The Electrochemical Society. | - |
dc.language | English | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.subject | CHEMICALLY BONDED POROGENS | - |
dc.subject | MESOPOROUS SILICA FILMS | - |
dc.subject | METHYL SILSESQUIOXANE | - |
dc.subject | HYDROGEN SILSESQUIOXANE | - |
dc.subject | INTEGRATION CHALLENGES | - |
dc.subject | MICROSTRUCTURE | - |
dc.subject | METHYLSILSESQUIOXANE | - |
dc.subject | COPOLYMERS | - |
dc.title | Organosilicate spin-on glasses - II. Effect of physical modification on mechanical properties | - |
dc.type | Article | - |
dc.identifier.wosid | 000188943800052 | - |
dc.identifier.scopusid | 2-s2.0-1842530089 | - |
dc.type.rims | ART | - |
dc.citation.volume | 151 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | F45 | - |
dc.citation.endingpage | F53 | - |
dc.citation.publicationname | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.contributor.localauthor | Kim, Sang Youl | - |
dc.contributor.nonIdAuthor | Toivola, Y | - |
dc.contributor.nonIdAuthor | Kim, S | - |
dc.contributor.nonIdAuthor | Cook, RF | - |
dc.contributor.nonIdAuthor | Char, K | - |
dc.contributor.nonIdAuthor | Lee, JK | - |
dc.contributor.nonIdAuthor | Yoon, DY | - |
dc.contributor.nonIdAuthor | Rhee, HW | - |
dc.contributor.nonIdAuthor | Jin, MY | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | CHEMICALLY BONDED POROGENS | - |
dc.subject.keywordPlus | MESOPOROUS SILICA FILMS | - |
dc.subject.keywordPlus | METHYL SILSESQUIOXANE | - |
dc.subject.keywordPlus | HYDROGEN SILSESQUIOXANE | - |
dc.subject.keywordPlus | INTEGRATION CHALLENGES | - |
dc.subject.keywordPlus | MICROSTRUCTURE | - |
dc.subject.keywordPlus | METHYLSILSESQUIOXANE | - |
dc.subject.keywordPlus | COPOLYMERS | - |
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