Organosilicate spin-on glasses - II. Effect of physical modification on mechanical properties

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dc.contributor.authorToivola, Yko
dc.contributor.authorKim, Sko
dc.contributor.authorCook, RFko
dc.contributor.authorChar, Kko
dc.contributor.authorLee, JKko
dc.contributor.authorYoon, DYko
dc.contributor.authorRhee, HWko
dc.contributor.authorKim, Sang Youlko
dc.contributor.authorJin, MYko
dc.date.accessioned2013-03-04T18:04:14Z-
dc.date.available2013-03-04T18:04:14Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2004-03-
dc.identifier.citationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.3, pp.F45 - F53-
dc.identifier.issn0013-4651-
dc.identifier.urihttp://hdl.handle.net/10203/83553-
dc.description.abstractPorous copolymer films were synthesized from a methylsilsequioxane: 1,2-bis(trimethoxysilyl)ethane (MSSQ: BTMSE) matrix and either an aromatic-core or aliphatic-core porogen at 10, 20, or 30 wt % porogen loading. Films were characterized using scanning electron microscopy (SEM), IR spectroscopy, and ellipsometry. Depth-sensing indentation experiments were performed to measure apparent film modulus, E-f', and hardness, H. Indentation load-displacement traces and SEM images were used to determine the threshold load for cracking, P-c. The aliphatic-core porogen produced a greater porosity film than the aromatic-core porogen for 10 wt % loading and smaller porosity films for 20 and 30 wt % loadings. IR spectra, normalized for film thickness and density, indicated decreased O-Si-O networking in porous MSSQ: BTMSE films. The combination of increased porosity and decreased O-Si-O networking led to a decreased apparent E-f' and H relative to the unmodified MSSQ: BTMSE film. However, low-porosity (approximately 7%), aliphatic-porogen MSSQ: BTMSE films are optimized relative to unmodified MSSQ with smaller dielectric constant and greater E-f' and H. (C) 2004 The Electrochemical Society.-
dc.languageEnglish-
dc.publisherELECTROCHEMICAL SOC INC-
dc.subjectCHEMICALLY BONDED POROGENS-
dc.subjectMESOPOROUS SILICA FILMS-
dc.subjectMETHYL SILSESQUIOXANE-
dc.subjectHYDROGEN SILSESQUIOXANE-
dc.subjectINTEGRATION CHALLENGES-
dc.subjectMICROSTRUCTURE-
dc.subjectMETHYLSILSESQUIOXANE-
dc.subjectCOPOLYMERS-
dc.titleOrganosilicate spin-on glasses - II. Effect of physical modification on mechanical properties-
dc.typeArticle-
dc.identifier.wosid000188943800052-
dc.identifier.scopusid2-s2.0-1842530089-
dc.type.rimsART-
dc.citation.volume151-
dc.citation.issue3-
dc.citation.beginningpageF45-
dc.citation.endingpageF53-
dc.citation.publicationnameJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.contributor.localauthorKim, Sang Youl-
dc.contributor.nonIdAuthorToivola, Y-
dc.contributor.nonIdAuthorKim, S-
dc.contributor.nonIdAuthorCook, RF-
dc.contributor.nonIdAuthorChar, K-
dc.contributor.nonIdAuthorLee, JK-
dc.contributor.nonIdAuthorYoon, DY-
dc.contributor.nonIdAuthorRhee, HW-
dc.contributor.nonIdAuthorJin, MY-
dc.type.journalArticleArticle-
dc.subject.keywordPlusCHEMICALLY BONDED POROGENS-
dc.subject.keywordPlusMESOPOROUS SILICA FILMS-
dc.subject.keywordPlusMETHYL SILSESQUIOXANE-
dc.subject.keywordPlusHYDROGEN SILSESQUIOXANE-
dc.subject.keywordPlusINTEGRATION CHALLENGES-
dc.subject.keywordPlusMICROSTRUCTURE-
dc.subject.keywordPlusMETHYLSILSESQUIOXANE-
dc.subject.keywordPlusCOPOLYMERS-
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