Effect of Si, Mg, and Mg-Zn doping on structural properties of a GaN layer grown by metalorganic chemical vapor deposition

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We have studied the structural properties of undoped, Si-doped, Mg-doped, and Mg-Zn codoped GaN using high-resolution X-ray diffraction (HRXRD) and transmission electron microscopy. When compared with undoped GaN, the dislocation density at the surface of the GaN layer decreases with Si doping and increases with Mg doping. In addition, we observed a reduction of dislocation density by codoping with Zn atoms in the Mg-doped GaN layer. The full width at half maximum of HRXRD shows that Si doping and Mg-Zn codoping improve the structural quality of the GaN layer as compared with undoped and Mg-doped GaN, respectively. (C) 2001 Elsevier Science Ltd. All rights reserved.
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Issue Date
2001-12
Language
English
Article Type
Article
Keywords

DOPED GAN; DISLOCATION-STRUCTURE; SAPPHIRE; FILMS

Citation

SOLID-STATE ELECTRONICS, v.45, no.12, pp.2023 - 2027

ISSN
0038-1101
URI
http://hdl.handle.net/10203/82371
Appears in Collection
MS-Journal Papers(저널논문)
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