DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Yang-Kyu | ko |
dc.contributor.author | Zhu, J | ko |
dc.contributor.author | Grunes, J | ko |
dc.contributor.author | Bokor, J | ko |
dc.contributor.author | Somorjai, GA | ko |
dc.date.accessioned | 2013-03-04T07:40:08Z | - |
dc.date.available | 2013-03-04T07:40:08Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-04 | - |
dc.identifier.citation | JOURNAL OF PHYSICAL CHEMISTRY B, v.107, no.15, pp.3340 - 3343 | - |
dc.identifier.issn | 1520-6106 | - |
dc.identifier.uri | http://hdl.handle.net/10203/82033 | - |
dc.description.abstract | A photolithography-based method capable of size reduction to produce sub-10-nm Si nanowire arrays on a wafer scale is described. By conformally depositing a material (silicon oxide or silicon) that has a different etching property over a lithographically defined sacrificial sidewall and selectively removing the sacrificial material, the sidewall material is preserved and can serve as nanopattern mask for further processing. The resolution of this method is not limited by photolithography but by the thickness of the material deposited. The application of size reduction nano-patterning method can range from the fabrication of biosensors to model catalyst systems. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | DIMENSIONAL THERMAL-OXIDATION | - |
dc.subject | ELECTRON-BEAM LITHOGRAPHY | - |
dc.subject | NANOSCALE CMOS | - |
dc.subject | SPACER FINFET | - |
dc.subject | TERABIT ERA | - |
dc.subject | TECHNOLOGY | - |
dc.subject | AREA | - |
dc.title | Fabrication of sub-10-nm silicon nanowire arrays by size reduction lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000182167500003 | - |
dc.identifier.scopusid | 2-s2.0-0345373824 | - |
dc.type.rims | ART | - |
dc.citation.volume | 107 | - |
dc.citation.issue | 15 | - |
dc.citation.beginningpage | 3340 | - |
dc.citation.endingpage | 3343 | - |
dc.citation.publicationname | JOURNAL OF PHYSICAL CHEMISTRY B | - |
dc.identifier.doi | 10.1021/JP0222649 | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | Zhu, J | - |
dc.contributor.nonIdAuthor | Grunes, J | - |
dc.contributor.nonIdAuthor | Bokor, J | - |
dc.contributor.nonIdAuthor | Somorjai, GA | - |
dc.type.journalArticle | Letter | - |
dc.subject.keywordPlus | DIMENSIONAL THERMAL-OXIDATION | - |
dc.subject.keywordPlus | ELECTRON-BEAM LITHOGRAPHY | - |
dc.subject.keywordPlus | NANOSCALE CMOS | - |
dc.subject.keywordPlus | SPACER FINFET | - |
dc.subject.keywordPlus | TERABIT ERA | - |
dc.subject.keywordPlus | TECHNOLOGY | - |
dc.subject.keywordPlus | AREA | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.