DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, BN | ko |
dc.contributor.author | Cho, Yong-Hoon | ko |
dc.contributor.author | Kim, YS | ko |
dc.contributor.author | Hong, W | ko |
dc.contributor.author | Woo, HJ | ko |
dc.date.accessioned | 2013-03-04T07:27:27Z | - |
dc.date.available | 2013-03-04T07:27:27Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-02 | - |
dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, pp.S199 - S201 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | http://hdl.handle.net/10203/82002 | - |
dc.description.abstract | An electron-beam lithography techniqe has been used to fabricate an ion-beam mask having a narrow pattern with a high aspect ratio for the application of ion-beam lithography. A conventional 40 kV electron-beam microscope was used for direct electron-beam writing, and was connected to a design computer by digital-to-analog converter. Polymethylmethacrylate with a thickness of 400 nm was used as a resist material. To achieve high aspect ratio and better interface quality, we used a multiple-pass electron-beam writing technique with a special design. As a result, we could obtain an electron-beam writing pattern with a linewidth of about 56 nm and an aspect ratio of about 1:7. | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.subject | X-RAY MASK | - |
dc.subject | SCALE | - |
dc.title | Direct electron-beam writing with high aspect ratio for fabricating ion-beam lithography mask | - |
dc.type | Article | - |
dc.identifier.wosid | 000181337500022 | - |
dc.identifier.scopusid | 2-s2.0-0037305537 | - |
dc.type.rims | ART | - |
dc.citation.volume | 42 | - |
dc.citation.beginningpage | S199 | - |
dc.citation.endingpage | S201 | - |
dc.citation.publicationname | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.contributor.localauthor | Cho, Yong-Hoon | - |
dc.contributor.nonIdAuthor | Lee, BN | - |
dc.contributor.nonIdAuthor | Kim, YS | - |
dc.contributor.nonIdAuthor | Hong, W | - |
dc.contributor.nonIdAuthor | Woo, HJ | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | electron-beam lithography | - |
dc.subject.keywordAuthor | high aspect ratio | - |
dc.subject.keywordAuthor | ion-beam lithography | - |
dc.subject.keywordAuthor | lithography | - |
dc.subject.keywordPlus | X-RAY MASK | - |
dc.subject.keywordPlus | SCALE | - |
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