DC Field | Value | Language |
---|---|---|
dc.contributor.author | Poon CH | ko |
dc.contributor.author | Tan LS | ko |
dc.contributor.author | Cho, Byung Jin | ko |
dc.contributor.author | Ng KT | ko |
dc.contributor.author | Bhat M | ko |
dc.contributor.author | Chan L | ko |
dc.date.accessioned | 2013-03-04T07:17:58Z | - |
dc.date.available | 2013-03-04T07:17:58Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-09 | - |
dc.identifier.citation | THIN SOLID FILMS, v.462, pp.72 - 75 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/10203/81949 | - |
dc.description.abstract | Hall measurements performed on laser annealed ultrashallow ion implanted p-type layers on n-type substrates over a wide temperature range showed expected p-type characteristics at low temperature but unexpected n-type behaviour at higher temperature. Samples annealed with lower laser energy fluences displayed the unexpected n-type characteristics over a wider temperature range compared to those annealed at higher energy fluences. These results can be explained by the increased contribution of the n-type substrate to the Hall readings, made possible by a more leaky junction, when the implant damage is inadequately removed. Thus, Hall measurements can be proposed as a quick evaluation tool of the integrity of laser annealed junctions without the need of device fabrication or high-resolution transmission electron microscopy. (C) 2004 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.title | Electrical evaluation of laser annealed junctions by Hall measurements | - |
dc.type | Article | - |
dc.identifier.wosid | 000223812800016 | - |
dc.identifier.scopusid | 2-s2.0-4344560429 | - |
dc.type.rims | ART | - |
dc.citation.volume | 462 | - |
dc.citation.beginningpage | 72 | - |
dc.citation.endingpage | 75 | - |
dc.citation.publicationname | THIN SOLID FILMS | - |
dc.identifier.doi | 10.1016/j.tsf.2004.05.024 | - |
dc.contributor.localauthor | Cho, Byung Jin | - |
dc.contributor.nonIdAuthor | Poon CH | - |
dc.contributor.nonIdAuthor | Tan LS | - |
dc.contributor.nonIdAuthor | Ng KT | - |
dc.contributor.nonIdAuthor | Bhat M | - |
dc.contributor.nonIdAuthor | Chan L | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordAuthor | silicon | - |
dc.subject.keywordAuthor | laser annealing | - |
dc.subject.keywordAuthor | Hall measurements | - |
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