DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | ko |
dc.contributor.author | Lee, JJ | ko |
dc.date.accessioned | 2013-03-03T23:07:14Z | - |
dc.date.available | 2013-03-03T23:07:14Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2002-03 | - |
dc.identifier.citation | POLYMER, v.43, no.6, pp.1963 - 1967 | - |
dc.identifier.issn | 0032-3861 | - |
dc.identifier.uri | http://hdl.handle.net/10203/80848 | - |
dc.description.abstract | The present paper describes a novel class of norbornene-based copolymers containing 7,7-dimethyloxepan-2-one acid labile groups. Poly(3-(bicyclo[2.2.1]hept-5-en-2-ylhydroxymethyl)-7, 7-dimethyloxepan-2-one-co-5-((2-decahydronaphthyl)oxycarbonyl)-norbornene-co-5-norbornene-2-carboxylic acid-co-maleic anhydride) was synthesized and evaluated as a potential chemically amplified resist for ArF lithography. The 7,7-dimethyloxepan-2-one group of the matrix polymer was readily cleaved and the carboxylic acid functionality was formed by acid-catalyzed ring-opening reaction in the exposed region after post-exposure bake. The resist patterns of 0.12 mum feature size were obtained at a dose of 10 mJ cm(-2) with a conventional developer, 2.38 wt% tetramethylammonium hydroxide aqueous solution, using an ArF excimer laser stepper. (C) 2002 Published by Elsevier Science Ltd. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject | NM RESIST APPLICATIONS | - |
dc.subject | ALICYCLIC POLYMERS | - |
dc.title | Synthesis and characterization of norbomene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists | - |
dc.type | Article | - |
dc.identifier.wosid | 000173545900034 | - |
dc.identifier.scopusid | 2-s2.0-0037074272 | - |
dc.type.rims | ART | - |
dc.citation.volume | 43 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 1963 | - |
dc.citation.endingpage | 1967 | - |
dc.citation.publicationname | POLYMER | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Lee, JJ | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | chemically amplified resist | - |
dc.subject.keywordAuthor | 7,7-dimethyloxepan-2-one | - |
dc.subject.keywordAuthor | ArF lithography | - |
dc.subject.keywordPlus | NM RESIST APPLICATIONS | - |
dc.subject.keywordPlus | ALICYCLIC POLYMERS | - |
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