Synthesis and characterization of norbomene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists

Cited 14 time in webofscience Cited 0 time in scopus
  • Hit : 353
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorKim, Jin-Baekko
dc.contributor.authorLee, JJko
dc.date.accessioned2013-03-03T23:07:14Z-
dc.date.available2013-03-03T23:07:14Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2002-03-
dc.identifier.citationPOLYMER, v.43, no.6, pp.1963 - 1967-
dc.identifier.issn0032-3861-
dc.identifier.urihttp://hdl.handle.net/10203/80848-
dc.description.abstractThe present paper describes a novel class of norbornene-based copolymers containing 7,7-dimethyloxepan-2-one acid labile groups. Poly(3-(bicyclo[2.2.1]hept-5-en-2-ylhydroxymethyl)-7, 7-dimethyloxepan-2-one-co-5-((2-decahydronaphthyl)oxycarbonyl)-norbornene-co-5-norbornene-2-carboxylic acid-co-maleic anhydride) was synthesized and evaluated as a potential chemically amplified resist for ArF lithography. The 7,7-dimethyloxepan-2-one group of the matrix polymer was readily cleaved and the carboxylic acid functionality was formed by acid-catalyzed ring-opening reaction in the exposed region after post-exposure bake. The resist patterns of 0.12 mum feature size were obtained at a dose of 10 mJ cm(-2) with a conventional developer, 2.38 wt% tetramethylammonium hydroxide aqueous solution, using an ArF excimer laser stepper. (C) 2002 Published by Elsevier Science Ltd.-
dc.languageEnglish-
dc.publisherELSEVIER SCI LTD-
dc.subjectNM RESIST APPLICATIONS-
dc.subjectALICYCLIC POLYMERS-
dc.titleSynthesis and characterization of norbomene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists-
dc.typeArticle-
dc.identifier.wosid000173545900034-
dc.identifier.scopusid2-s2.0-0037074272-
dc.type.rimsART-
dc.citation.volume43-
dc.citation.issue6-
dc.citation.beginningpage1963-
dc.citation.endingpage1967-
dc.citation.publicationnamePOLYMER-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorLee, JJ-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorchemically amplified resist-
dc.subject.keywordAuthor7,7-dimethyloxepan-2-one-
dc.subject.keywordAuthorArF lithography-
dc.subject.keywordPlusNM RESIST APPLICATIONS-
dc.subject.keywordPlusALICYCLIC POLYMERS-
Appears in Collection
CH-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 14 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0