DC Field | Value | Language |
---|---|---|
dc.contributor.author | 임태우 | ko |
dc.contributor.author | 박상후 | ko |
dc.contributor.author | 양동열 | ko |
dc.contributor.author | 이신욱 | ko |
dc.date.accessioned | 2013-03-03T21:57:15Z | - |
dc.date.available | 2013-03-03T21:57:15Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-06 | - |
dc.identifier.citation | 한국정밀공학회지, v.21, no.6, pp.160 - 166 | - |
dc.identifier.issn | 1225-9071 | - |
dc.identifier.uri | http://hdl.handle.net/10203/80616 | - |
dc.description.abstract | In this study, a new algorithm, named as Contour Offset Algorithm(COA) is developed to fabricate precise features or patterns in the range of several micrometers by nano replication printing(nRP) process. In the nRP process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid monomer according to a voxel matrix which is transformed from the bitmap format file. After polymerization, a droplet of ethanol is dropped to remove the unnecessary remaining liquid resin and then only the polymerized figures with nano-scaled precision are remaining on the glass plate. To obtain more precise replicated features, the contour lines in voxel matrix should be modified considering a voxel size. In this study, the efficiency of the proposed method is shown through two examples in view of accuracy. | - |
dc.language | Korean | - |
dc.publisher | 한국정밀공학회 | - |
dc.title | 복셀 차감법에 의한 나노 복화(複畵)공정 정밀화 | - |
dc.title.alternative | Development of Contour Offset Algorithm(COA) in nRP Process for Fabricating Nano-precision Features | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 21 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 160 | - |
dc.citation.endingpage | 166 | - |
dc.citation.publicationname | 한국정밀공학회지 | - |
dc.contributor.localauthor | 양동열 | - |
dc.contributor.nonIdAuthor | 임태우 | - |
dc.contributor.nonIdAuthor | 박상후 | - |
dc.contributor.nonIdAuthor | 이신욱 | - |
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