DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, SG | ko |
dc.contributor.author | Chang, Kee-Joo | ko |
dc.date.accessioned | 2013-03-03T01:12:57Z | - |
dc.date.available | 2013-03-03T01:12:57Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1996-04 | - |
dc.identifier.citation | PHYSICAL REVIEW B, v.53, no.15, pp.9784 - 9790 | - |
dc.identifier.issn | 1098-0121 | - |
dc.identifier.uri | http://hdl.handle.net/10203/76428 | - |
dc.description.abstract | We perform ab initio pseudopotential calculations for studying the stability of carbon-related defects and the atomic model for the hydrogen passivation of substitutional carbons in InAs. Among various C-related defects, the most stable one is found to be a substitutional C acceptor occupying an As site. As compared to GaAs, substitutional C impurities are found to have higher formation energies, due to large lattice distortions surrounding the C atom, thus, C incorporation into bulk InAs is more difficult. Because of the small atomic radius and deep atomic energy levels of C, when C occupies an In site, its defect energy level lies below the valence band maximum (VBM), and it behaves as an acceptor, however, the formation energy is much higher than for C-As. We note that an inversion between the VBM and the C-In energy level takes place as pressure increases. For both the substitutional C-As and C-In, we find that hydrogen neutralizes the electrical activity of accepters by occupying a bond-centered site between the C atom and one of its neighbors. In an In0.5Ga0.5As alloy, the C acceptor is found to favor an As site with In neighbors, with the formation energy lying between InAs and GaAs. Thus, the calculated acceptor concentration of 10(17) - 10(18) cm(-3) is much lower than the maximum carrier density achievable in GaAs. | - |
dc.language | English | - |
dc.publisher | AMERICAN PHYSICAL SOC | - |
dc.subject | MOLECULAR-BEAM EPITAXY | - |
dc.subject | CRYSTALLINE SILICON | - |
dc.subject | ATOMIC-STRUCTURE | - |
dc.subject | GAAS | - |
dc.subject | GROWTH | - |
dc.subject | MOMBE | - |
dc.subject | PSEUDOPOTENTIALS | - |
dc.subject | DEPENDENCE | - |
dc.subject | DIFFUSION | - |
dc.subject | COMPLEXES | - |
dc.title | Energetics and hydrogen passivation of carbon-related defects in InAs and In0.5Ga0.5As | - |
dc.type | Article | - |
dc.identifier.wosid | A1996UJ29600056 | - |
dc.identifier.scopusid | 2-s2.0-0000437150 | - |
dc.type.rims | ART | - |
dc.citation.volume | 53 | - |
dc.citation.issue | 15 | - |
dc.citation.beginningpage | 9784 | - |
dc.citation.endingpage | 9790 | - |
dc.citation.publicationname | PHYSICAL REVIEW B | - |
dc.contributor.localauthor | Chang, Kee-Joo | - |
dc.contributor.nonIdAuthor | Lee, SG | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | MOLECULAR-BEAM EPITAXY | - |
dc.subject.keywordPlus | CRYSTALLINE SILICON | - |
dc.subject.keywordPlus | ATOMIC-STRUCTURE | - |
dc.subject.keywordPlus | GAAS | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | MOMBE | - |
dc.subject.keywordPlus | PSEUDOPOTENTIALS | - |
dc.subject.keywordPlus | DEPENDENCE | - |
dc.subject.keywordPlus | DIFFUSION | - |
dc.subject.keywordPlus | COMPLEXES | - |
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