Energetics and hydrogen passivation of carbon-related defects in InAs and In0.5Ga0.5As

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dc.contributor.authorLee, SGko
dc.contributor.authorChang, Kee-Jooko
dc.date.accessioned2013-03-03T01:12:57Z-
dc.date.available2013-03-03T01:12:57Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1996-04-
dc.identifier.citationPHYSICAL REVIEW B, v.53, no.15, pp.9784 - 9790-
dc.identifier.issn1098-0121-
dc.identifier.urihttp://hdl.handle.net/10203/76428-
dc.description.abstractWe perform ab initio pseudopotential calculations for studying the stability of carbon-related defects and the atomic model for the hydrogen passivation of substitutional carbons in InAs. Among various C-related defects, the most stable one is found to be a substitutional C acceptor occupying an As site. As compared to GaAs, substitutional C impurities are found to have higher formation energies, due to large lattice distortions surrounding the C atom, thus, C incorporation into bulk InAs is more difficult. Because of the small atomic radius and deep atomic energy levels of C, when C occupies an In site, its defect energy level lies below the valence band maximum (VBM), and it behaves as an acceptor, however, the formation energy is much higher than for C-As. We note that an inversion between the VBM and the C-In energy level takes place as pressure increases. For both the substitutional C-As and C-In, we find that hydrogen neutralizes the electrical activity of accepters by occupying a bond-centered site between the C atom and one of its neighbors. In an In0.5Ga0.5As alloy, the C acceptor is found to favor an As site with In neighbors, with the formation energy lying between InAs and GaAs. Thus, the calculated acceptor concentration of 10(17) - 10(18) cm(-3) is much lower than the maximum carrier density achievable in GaAs.-
dc.languageEnglish-
dc.publisherAMERICAN PHYSICAL SOC-
dc.subjectMOLECULAR-BEAM EPITAXY-
dc.subjectCRYSTALLINE SILICON-
dc.subjectATOMIC-STRUCTURE-
dc.subjectGAAS-
dc.subjectGROWTH-
dc.subjectMOMBE-
dc.subjectPSEUDOPOTENTIALS-
dc.subjectDEPENDENCE-
dc.subjectDIFFUSION-
dc.subjectCOMPLEXES-
dc.titleEnergetics and hydrogen passivation of carbon-related defects in InAs and In0.5Ga0.5As-
dc.typeArticle-
dc.identifier.wosidA1996UJ29600056-
dc.identifier.scopusid2-s2.0-0000437150-
dc.type.rimsART-
dc.citation.volume53-
dc.citation.issue15-
dc.citation.beginningpage9784-
dc.citation.endingpage9790-
dc.citation.publicationnamePHYSICAL REVIEW B-
dc.contributor.localauthorChang, Kee-Joo-
dc.contributor.nonIdAuthorLee, SG-
dc.type.journalArticleArticle-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusCRYSTALLINE SILICON-
dc.subject.keywordPlusATOMIC-STRUCTURE-
dc.subject.keywordPlusGAAS-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusMOMBE-
dc.subject.keywordPlusPSEUDOPOTENTIALS-
dc.subject.keywordPlusDEPENDENCE-
dc.subject.keywordPlusDIFFUSION-
dc.subject.keywordPlusCOMPLEXES-
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