On-chip interconnect lines with patterned ground shields

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dc.contributor.authorLowther, Rko
dc.contributor.authorLee, Sang-Gugko
dc.date.accessioned2013-03-03T00:28:58Z-
dc.date.available2013-03-03T00:28:58Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2000-02-
dc.identifier.citationIEEE MICROWAVE AND GUIDED WAVE LETTERS, v.10, no.2, pp.49 - 51-
dc.identifier.issn1051-8207-
dc.identifier.urihttp://hdl.handle.net/10203/76249-
dc.description.abstractMeasurements of on-chip interconnect lines with a patterned ground shield (PGS) are analyzed and compared to lines with no ground shield (NGS), At frequencies at and below 7 GHz, the PGS lines have about one fifth the dissipative loss of that of the NGS lines. By using a doped layer in the silicon for the shield, as opposed to other metal layers which are closer to the line, a reasonably high characteristic impedance is maintained. The transmission line characteristics are also analyzed.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleOn-chip interconnect lines with patterned ground shields-
dc.typeArticle-
dc.identifier.wosid000087081500001-
dc.identifier.scopusid2-s2.0-0033720299-
dc.type.rimsART-
dc.citation.volume10-
dc.citation.issue2-
dc.citation.beginningpage49-
dc.citation.endingpage51-
dc.citation.publicationnameIEEE MICROWAVE AND GUIDED WAVE LETTERS-
dc.identifier.doi10.1109/75.843097-
dc.contributor.localauthorLee, Sang-Gug-
dc.contributor.nonIdAuthorLowther, R-
dc.type.journalArticleArticle-
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