DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chung, HB | ko |
dc.contributor.author | Lee, KH | ko |
dc.contributor.author | Kim, DH | ko |
dc.contributor.author | Yoo, Hyung Joun | ko |
dc.date.accessioned | 2013-03-02T19:22:03Z | - |
dc.date.available | 2013-03-02T19:22:03Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1997-06 | - |
dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.30, no.3, pp.534 - 539 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | http://hdl.handle.net/10203/75136 | - |
dc.description.abstract | An ArF excimer laser exposure tool is expected as a work horse in the sub-quarter-micron lithography era. We have been trying to develop such an exposure tool. As a part of this development project, we have designed an optical system that uses an ArF excimer laser as an illuminating light source. The optical system is a catadioptric system and uses a polarizing beam splitter and a quarter-wave plate to eliminate the central obscuration of the system, its specifications are a numerical aperture of 0.5, a reduction ratio of 1/4, and a field size of phi 24 mm (or 22x5 mm(2) slit). The modulation transfer function values at 2500 cycles/mm are more than 40%. We have also analyzed the permissible tolerances of the system parameters. The resultant permissible tolerances are lambda/10 for the mirror surface, lambda/4 for the lens surface, +/-5 mu m for the lens thickness and the spacing between lenses, 0.5 minutes of are for eccentricity, 300 pm for the laser bandwidth, and +/-0.1 degrees C for the temperature. | - |
dc.language | English | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.subject | FUSED-SILICA | - |
dc.title | Design and tolerancing of ArF excimer laser optics for lithography | - |
dc.type | Article | - |
dc.identifier.wosid | A1997XE86600007 | - |
dc.identifier.scopusid | 2-s2.0-0031528755 | - |
dc.type.rims | ART | - |
dc.citation.volume | 30 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 534 | - |
dc.citation.endingpage | 539 | - |
dc.citation.publicationname | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.contributor.localauthor | Yoo, Hyung Joun | - |
dc.contributor.nonIdAuthor | Chung, HB | - |
dc.contributor.nonIdAuthor | Lee, KH | - |
dc.contributor.nonIdAuthor | Kim, DH | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | FUSED-SILICA | - |
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