Crystallographic Characteristics of ZnO Films deposited on SiO$_2$/Si Substrate
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park H.D | ko |
| dc.contributor.author | Kim K.S | ko |
| dc.contributor.author | Lee C.S | ko |
| dc.contributor.author | Kim J.W | ko |
| dc.contributor.author | Han B.M | ko |
| dc.contributor.author | Kim S.Y | ko |
| dc.date.accessioned | 2013-02-28T06:11:03Z | - |
| dc.date.available | 2013-02-28T06:11:03Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1995-01 | - |
| dc.identifier.citation | 한국표면공학회지, v.28, no.6, pp.386 - 392 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/73168 | - |
| dc.language | English | - |
| dc.publisher | 한국표면공학회 | - |
| dc.title | Crystallographic Characteristics of ZnO Films deposited on SiO$_2$/Si Substrate | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 28 | - |
| dc.citation.issue | 6 | - |
| dc.citation.beginningpage | 386 | - |
| dc.citation.endingpage | 392 | - |
| dc.citation.publicationname | 한국표면공학회지 | - |
| dc.contributor.localauthor | Kim S.Y | - |
| dc.contributor.nonIdAuthor | Park H.D | - |
| dc.contributor.nonIdAuthor | Kim K.S | - |
| dc.contributor.nonIdAuthor | Lee C.S | - |
| dc.contributor.nonIdAuthor | Kim J.W | - |
| dc.contributor.nonIdAuthor | Han B.M | - |
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