DC Field | Value | Language |
---|---|---|
dc.contributor.author | 배귀남 | ko |
dc.contributor.author | 이춘식 | ko |
dc.contributor.author | 박승오 | ko |
dc.contributor.author | 안강호 | ko |
dc.date.accessioned | 2013-02-27T19:15:12Z | - |
dc.date.available | 2013-02-27T19:15:12Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1995-08 | - |
dc.identifier.citation | 설비공학논문집, v.7, no.3, pp.521 - 527 | - |
dc.identifier.issn | 1229-6422 | - |
dc.identifier.uri | http://hdl.handle.net/10203/70321 | - |
dc.description.abstract | The average particle deposition velocity toward a vertical wafer surface in a vertical airflow chamber was measured by a wafer surface scanner(PMS Model SAS-3600). Polystyrene latex(PSL) spheres with diameters between 0.3 and 0.8㎛ were used. To examine the effect of the airflow velocity on the deposition velocity, experiments were conducted for three vertical airflow velocities ; 20, 30, 50cm/s. Experimental data of particle deposition velocity were compared with those given by prediction model suggested by Liu and Ahn(1987). | - |
dc.language | Korean | - |
dc.publisher | 대한설비공학회 | - |
dc.title | 수직 웨이퍼상의 입자 침착 속도의 측정 | - |
dc.title.alternative | Measurement of Particle Deposition Velocity Toward a Vertical Wafer Surface | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.citation.volume | 7 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 521 | - |
dc.citation.endingpage | 527 | - |
dc.citation.publicationname | 설비공학논문집 | - |
dc.contributor.localauthor | 박승오 | - |
dc.contributor.nonIdAuthor | 배귀남 | - |
dc.contributor.nonIdAuthor | 이춘식 | - |
dc.contributor.nonIdAuthor | 안강호 | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.