Browse "College of Engineering(공과대학)" by Subject X-ray photoelectron spectroscopy
Showing results 1 to 20 of 20
| A comparative study on the Si precursors for the atomic layer deposition of silicon nitride thin films Lee, WJ; Lee, JH; Park, Chong-Ook; Lee, YS; Shin, SJ; Rha, SK, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.5, pp.1352 - 1355, 2004-11 |
| Characterization of chemical vapor deposition-grown graphene films with various etchants Choi, Hon-Kyw; Kim, Jong Yun; Jeong, Hu Young; Choi, Choon-Gi; Choi, Sung-Yool, Carbon Letters, v.13, no.1, pp.44 - 47, 2012-01 |
| Chemical aspect of oxygen dissolved in a dimethyl sulfoxide-based electrolyte on lithium metal Lee, Hongkyung; Lee, Dong-Jin; Lee, Je-Nam; Song, Jong-Chan; Lee, Yunju; Ryou, Myung-Hyun; Park, Jung-Ki; et al, ELECTROCHIMICA ACTA, v.123, pp.419 - 425, 2014-03 |
| Dependence of hydrogen and oxygen incorporation on deposition parameters in photochemical vapor deposited mercury free silicon nitride films Sahu, BS; Srivastava, P; Agnihotri, OP; Lee, Hee Chul; Sekhar, BR; Mahapatra, S, THIN SOLID FILMS, v.446, pp.23 - 28, 2004-01 |
| Effect of atmospheric pressure plasma treatment for repair of polymer matrix composite for aerospace applications Kumar, Sarath; Abhishek, G; Ullattil, Akhil; Elangundran, TVA; Bhowmik, Shantanu; Devadathan, Saji; Kim, Chun-Gon; et al, JOURNAL OF COMPOSITE MATERIALS, v.50, no.11, pp.1497 - 1507, 2016-05 |
| Effect of CxNy Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering Roh, Kimin; Na, Byung-Keun; Choi, Si-Kyung; Kim, Jung-Hyung; Seong, Dae-Jin; Kim, Jung-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.11, pp.8530 - 8533, 2008-11 |
| Effect of heat treatment on PtRu/C catalyst for methanol electro-oxidation Jeon, Min-Ku; Lee, Ki-Rak; Jeon, Hee-Jung; Woo, Seong-Ihl, JOURNAL OF APPLIED ELECTROCHEMISTRY, v.39, no.9, pp.1503 - 1508, 2009-09 |
| Effects of vinylene carbonate and 1,3-propane sultone on high-rate cycle performance and surface properties of high-nickel layered oxide cathodes Oh, Jimin; Kim, Jumi; Lee, Yong Min; Kim, Ju Young; Shin, Dong Ok; Lee, Myeong Ju; HONG, DANIEL SEUNGBUM; et al, MATERIALS RESEARCH BULLETIN, v.132, pp.111008, 2020-12 |
| Electronic structure simulation of chromium aluminum oxynitride by discrete variational-X alpha method and X-ray photoelectron spectroscopy Choi, YM; Chang, HJ; Do Lee, J; Kim, E; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.41, no.9, pp.5805 - 5808, 2002-09 |
| Enhanced ferromagnetic properties and high temperature dielectric anomalies in Bi0.9Ca0.05Sm0.05FeO3 prepared by hydrothermal method Bharathi, K. Kamala; Ramesh, G.; Patro, L. N.; Raju, N. Ravi Chandra; Kim, Do-Kyung, MATERIALS RESEARCH BULLETIN, v.62, pp.5 - 10, 2015-02 |
| High-resolution X-ray photoelectron spectroscopy study of InTe thin film in structural phase transition from amorphous to crystalline phase Lee, Young Mi; Park, Yongsup; Sun, Chang-Woo; Lee, JeongYong; Shin, Hyun Joon; Kim, Yong Tae; Jung, Min-Cherl, THIN SOLID FILMS, v.518, no.15, pp.4442 - 4445, 2010-05 |
| Impact of an extracellular polymeric substance (EPS) precoating on the initial adhesion of Burkholderia cepacia and Pseudomonas aeruginosa Hwang, Geelsu; Kang, Seoktae; El-Din, Mohamed Gamal; Liu, Yang, BIOFOULING, v.28, no.6, pp.525 - 538, 2012-06 |
| Optical properties of thin amorphous silicon film on a phase shift mask for 157 nm lithography Kim, SungKwan; Kim, YangSoo; Choi, YoungMin; Choi, JongWan; Hong, Jongin; Shon, JungMin; Sung, Tae-Hyun; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.5A, pp.2523 - 2529, 2004-05 |
| Oxide Heterostructure Resistive Memory Yang, Yuchao; Choi, ShinHyun; Lu, Wei, NANO LETTERS, v.13, no.6, pp.2908 - 2915, 2013-06 |
| Poisoning effect of SO2 on NO reduction by i-butane over Fe/ZSM-5 prepared by sublimation method Decyk, P; Kim, DK; Woo, Seong-Ihl, JOURNAL OF CATALYSIS, v.203, no.2, pp.369 - 374, 2001-10 |
| Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01 |
| Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2 Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05 |
| The effect of Ni loading and the sulfidation temperature on the structure and catalytic activity of Ni-W hydrodesulfurization catalysts Kim, CH; Yoon, WL; Lee, IC; Woo, Seong-Ihl, APPLIED CATALYSIS A-GENERAL, v.144, no.1-2, pp.159 - 175, 1996-09 |
| Water-induced degradation of chromium fluoride films Kim, EN; Hong, Daniel Seungbum; Gorman, JD; Lim, SC; Moon, SY; Kim, DW; No, Kwangsoo, THIN SOLID FILMS, v.324, no.1-2, pp.292 - 299, 1998-07 |
| Work function investigations of Al-doped ZnO for band-alignment in electronic and optoelectronic applications Drewelow, Grant; Reed, Austin; Stone, Chandon; Roh, Kwangdong; Jiang, Zhong-Tao; Linh Nguyen Thi Truc; No, Kwangsoo; et al, APPLIED SURFACE SCIENCE, v.484, pp.990 - 998, 2019-08 |
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