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Reliability of thin gate oxides irradiated under X-ray lithography conditions Cho, Byung Jin; Kim, SJ; Ang, CH; Ling, CH; Joo, MS; Yeo, IS, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.4B, pp.2819 - 2822, 2001-04 |
제조공정과 사용조건을 고려한 X-선 마스크의 변형해석 = Analysis of structural distortions of an X-ray mask considering fabrication processes and writing conditionslink 김일용; Kim, Il-Yong; et al, 한국과학기술원, 1997 |
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