Browse "College of Engineering(공과대학)" by Subject TA2O5 FILMS
Showing results 3 to 5 of 5
| MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILM PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION KIM, I; AHN, SD; CHO, BW; Ahn, SungTae; Lee, JeongYong; CHUN, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.33, no.12A, pp.6691 - 6698, 1994-12 |
| MIM capacitors using atomic-layer-deposited high-kappa (HfO2)(1-x)(Al2O3)(x) dielectrics Hu, H; Zhu, CX; Yu, XF; Chin, A; Li, MF; Cho, Byung Jin; Kwong, DL; et al, IEEE ELECTRON DEVICE LETTERS, v.24, no.2, pp.60 - 62, 2003-02 |
| STRUCTURAL-PROPERTIES OF TITANIUM-DIOXIDE FILMS GROWN ON P-SI BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION AT LOW-TEMPERATURE YOON, YS; KANG, WN; YOM, SS; KIM, TW; JUNG, M; PARK, TH; SEO, KY; et al, THIN SOLID FILMS, v.238, no.1, pp.12 - 14, 1994-01 |
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