APPLICATIONS OF RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION TECHNOLOGY TO ULSI MATERIAL PROCESSING AND DEVICE FABRICATION
Rapid thermal chemical vapor deposition (RT-CVD) has received considerable attention as a novel in situ multiprocessing tool capable of meeting the stringent requirements of ULSI manufacturing. In this paper, we review the significant benefits provided by RT-CVD for IC manufacturing and the progress made in developing RT-CVD as an integrated processing module for ULSI device fabrication.
- Publisher
- ELSEVIER SCIENCE SA LAUSANNE
- Issue Date
- 1994-04
- Language
- English
- Article Type
- Article; Proceedings Paper
- Citation
THIN SOLID FILMS, v.241, no.1-2, pp.329 - 334
- ISSN
- 0040-6090
- Appears in Collection
- EE-Journal Papers(저널논문)
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