ELECTRON-BEAM EXPOSURE (EBE) AND EPITAXY OF GAAS FILMS ON CAF2/SI STRUCTURES
- Publisher
- JAPAN J APPLIED PHYSICS
- Issue Date
- 1988-09
- Language
- English
- Article Type
- Article
- Citation
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.27, no.9, pp.1616 - 1625
- ISSN
- 0021-4922
- Appears in Collection
- EE-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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