Hall Effect in Ion-Implanted YBa2Cu3O7-x Thin Films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | k.-h. yoo | ko |
| dc.contributor.author | y.y. song | ko |
| dc.contributor.author | h.k. kim | ko |
| dc.contributor.author | y.k. park | ko |
| dc.contributor.author | j.c. park | ko |
| dc.contributor.author | j.y. lee | ko |
| dc.date.accessioned | 2013-02-25T14:46:42Z | - |
| dc.date.available | 2013-02-25T14:46:42Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1992 | - |
| dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.25, no.6, pp.546 - 549 | - |
| dc.identifier.issn | 0374-4884 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/62972 | - |
| dc.language | Korean | - |
| dc.publisher | Korean Physical Soc | - |
| dc.title | Hall Effect in Ion-Implanted YBa2Cu3O7-x Thin Films | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 25 | - |
| dc.citation.issue | 6 | - |
| dc.citation.beginningpage | 546 | - |
| dc.citation.endingpage | 549 | - |
| dc.citation.publicationname | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
| dc.contributor.localauthor | j.y. lee | - |
| dc.contributor.nonIdAuthor | k.-h. yoo | - |
| dc.contributor.nonIdAuthor | y.y. song | - |
| dc.contributor.nonIdAuthor | h.k. kim | - |
| dc.contributor.nonIdAuthor | y.k. park | - |
| dc.contributor.nonIdAuthor | j.c. park | - |
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