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Oxide thickness profile measurement by dispersive white-light interferometry in CMP process

Jeong, Haedo; Park, Boumyoung; Kim, Youngjin; Kim, Hyoungjae; Ghim, Young-Sik; You, Joonho; Kim, Seung-Woo, 2007 International Conference on Planarization/CMP Technology, ICPT 2007, pp.179 - 186, VDE Verlag GmbH, 2007-10

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