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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Photodissociation effects on the electron density and on FTIR measurements in a BTMSM/Ar discharge Jung, WB; Jang, YJ; Choi, CK; Chang, Hong-Young, JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.40, pp.4164 - 4167, 2007-07 | |
| Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma You, SJ; Bai, KH; In, JH; Chang, Hong-Young; Choi, CK, SURFACE & COATINGS TECHNOLOGY, v.171, pp.226 - 230, 2003-07 | |
| The deposition of SiOF film with low dielectric constant in a helicon plasma source Kim, JH; See, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, APPLIED PHYSICS LETTERS, v.68, no.11, pp.1507 - 1509, 1996-03 | |
| Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Oh, KS; Choi, CK, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.38, no.7B, pp.4531 - 4534, 1999-07 | |
| Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; Kim, KH, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05 | |
| A study on low dielectric material deposition using a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09 | |
| Electron temperature control with a small mesh number grid in inductively coupled plasmas Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11 | |
| A study on the formation and characteristics of the Si-O-C-H composite thin films with low dielectric constant for advanced semiconductor devices Yang, CS; Oh, KS; Ryu, JY; Kim, DC; Shou-Yong, J; Choi, CK; Lee, HJ; Um, SH; Chang, Hong-Young, THIN SOLID FILMS, v.390, no.1-2, pp.113 - 118, 2001-06 | |
| The effects of mixing molecular gases on plasma parameters in a system with a grid-controlled electron temperature Bai, KH; Hong, JI; You, SJ; Choi, CK; Chang, Hong-Young, PHYSICS OF PLASMAS, v.9, no.3, pp.1025 - 1028, 2002-03 | |
| SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07 |
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