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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Si etching rate calculation for low pressure high density plasma source using Cl-2 gas Lee, YD; Chang, Hong-Young; Chang, Choong-Seock, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.5, pp.2224 - 2229, 2000 | |
| A new inside-type segmented coil antenna for uniformity control in a large-area inductively coupled plasma Lee, Pyung-Woo; Kim, Sung-Sik; Seo, Sang-Hun; Chang, Choong-Seock; Chang, Hongyoung; Ichiki,Takanori; Horiike,Yasuhiro, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.39, no.6A, pp.548 - 550, 2000-06 |