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Results 1-1 of 1 (Search time: 0.004 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
Si etching rate calculation for low pressure high density plasma source using Cl-2 gas

Lee, YD; Chang, Hong-Young; Chang, Choong-Seock, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.5, pp.2224 - 2229, 2000

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