Showing results 1 to 11 of 11
A study on low dielectric material deposition using a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09 |
Electrical characteristics of helicon wave plasmas Yun, SM; Kim, JH; Chang, Hong-Young, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.26, no.2, pp.159 - 166, 1998-04 |
Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; et al, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05 |
Frequency dependence of helicon wave plasmas near lower hybrid resonance frequency Yun, SM; Kim, JH; Chang, Hong-Young, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.15, no.3, pp.673 - 677, 1997 |
Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Kang, MS; Choi, CK, THIN SOLID FILMS, v.341, no.1-2, pp.109 - 111, 1999-03 |
Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Oh, KS; Choi, CK, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.38, no.7B, pp.4531 - 4534, 1999-07 |
m=+/-1 and m=+/-2 mode helicon wave excitation Kim, JH; Yun, SM; Chang, Hong-Young, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.24, no.6, pp.1364 - 1370, 1996-12 |
M=+1 mode helicon wave excitation using solenoid antenna Kim, JH; Yun, SM; Chang, Hong-Young, PHYSICS LETTERS A, v.221, no.1-2, pp.94 - 98, 1996-09 |
Radial density profile change near lower hybrid frequency in M=0 helicon wave plasmas Yun, SM; Chang, Hong-Young, PHYSICS LETTERS A, v.248, no.5-6, pp.400 - 404, 1998-11 |
SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07 |
The deposition of SiOF film with low dielectric constant in a helicon plasma source Kim, JH; See, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, APPLIED PHYSICS LETTERS, v.68, no.11, pp.1507 - 1509, 1996-03 |
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