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Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source

S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04

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