Browse "PH-Journal Papers(저널논문)" by Subject POLYSILICON

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Si etching rate calculation for low pressure high density plasma source using Cl-2 gas

Lee, YD; Chang, Hong-Young; Chang, Choong-Seock, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.5, pp.2224 - 2229, 2000

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