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Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10 |
The characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton Lee, H. S.; Lee, Yun-Seong; Seo, S. H.; Chang, Hong-Young, THIN SOLID FILMS, v.519, pp.6955 - 6959, 2011-08 |
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