Browse "PH-Journal Papers(저널논문)" by Subject LOW DIELECTRIC-CONSTANT
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| Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; et al, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05 |
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