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A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering In, Jung-Hwan; Seo, Sang-Hun; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.202, no.22-23, pp.5298 - 5301, 2008-08 |
Characteristics of the Deposition Rate per Unit Power on Pulsed-DC Magnetron Sputtering Source An, Sang-Hyuk; In, Jung-Hwan; Chang, Hong-Young, PLASMA PROCESSES AND POLYMERS, v.6, no.12, pp.855 - 859, 2009-12 |
Effects of substrate bias on electron energy distribution in magnetron sputtering system Seo, Sang-Hun; In, Jung-Hwan; Chang, Hong-Young; Han, Jeon-Geon, PHYSICS OF PLASMAS, v.11, no.10, pp.4796 - 4800, 2004-10 |
The trend of electron temperature and electron density in the process of microcrystalline silicon solar cells Lee, Yun-Seong; In, Jung-Hwan; Ahn, Seung-Kyu; Seo, Sang-Hun; Chang, Hong-Young; You, Dong-Joo; Ahn, Seh-Won; et al, CURRENT APPLIED PHYSICS, v.10, pp.S234 - S236, 2010-03 |
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