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Production of high density plasma on the substrate in a helicon source and application to the deposition of SiOF film with low dielectric constant Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical society, 1995 |
The deposition of SiOF film with low dielectric constant in a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Lee, KM; Choi, CK; Chang, Hong-Young, 3rd Asia-Pacific Conference on Plasma Science & Technology, Plasma Science & Technology, 1996 |
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