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Showing results 1 to 5 of 5

1
Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching

Seo, SH; Kim, JH; Lee, PW; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical Society, 1995

2
Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in and Electron cyclotron Resonance SF6/Ar Discharge

Kim, YJ; Lee, PW; Chang, Hong-Young, ECS Meeting , The electrochemical society, 1995

3
Mach probe in electron cyclotron resonance plasma

Chang, Hong-Young; Lee, PW, 2nd APCPST, APCPST, 1995

4
Real Time Intrusive Optical emission spectroscopy for process control

Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995

5
Study of Helicon Wave Plasma Production and Its Characteristics

Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994

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