Showing results 1 to 5 of 5
Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching Seo, SH; Kim, JH; Lee, PW; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical Society, 1995 |
Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in and Electron cyclotron Resonance SF6/Ar Discharge Kim, YJ; Lee, PW; Chang, Hong-Young, ECS Meeting , The electrochemical society, 1995 |
Mach probe in electron cyclotron resonance plasma Chang, Hong-Young; Lee, PW, 2nd APCPST, APCPST, 1995 |
Real Time Intrusive Optical emission spectroscopy for process control Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995 |
Study of Helicon Wave Plasma Production and Its Characteristics Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994 |
Discover