Showing results 1 to 7 of 7
Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in and Electron cyclotron Resonance SF6/Ar Discharge Kim, YJ; Lee, PW; Chang, Hong-Young, ECS Meeting , The electrochemical society, 1995 |
Examination on the validity of plasma parameter normalization method(PPNM) for the determination of the relative concentration of F radical atoms Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Thechnology, Plasma Science and Thechnology, 1995 |
Half-Dimensional Model of the Plasma Distribution in ECR Plasma Moon, SJ; Kim, YJ; Chang, Choong-Seock; Chang, Hong-Young, The 2nd Asia-Pacific Conference on Plasma Science and Technology, 1995 |
Impurity Doping Effect in High $T_c$ Superconductors Kim, YJ; Chang, Kee-Joo, Bull. Am. Phys. Soc., pp.409 - 409, APS, 1998 |
Real Time Intrusive Optical emission spectroscopy for process control Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995 |
Study of Helicon Wave Plasma Production and Its Characteristics Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994 |
Weak Localization Effect in Superconducting Thin Films Kim, YJ; Chang, Kee-Joo, Bull. Am. Phys. Soc., pp.715 - 715, APS, 1997 |
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