Study of ECR Plasma Etching Device
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | sun-kyu song | ko |
| dc.contributor.author | hong-young chang | ko |
| dc.contributor.author | c. s. chang | ko |
| dc.contributor.author | duk-in choi | ko |
| dc.date.accessioned | 2013-02-25T12:18:56Z | - |
| dc.date.available | 2013-02-25T12:18:56Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990 | - |
| dc.identifier.citation | 한국응용물리학회지, v.3, pp.171 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/62139 | - |
| dc.language | Korean | - |
| dc.publisher | 한국응용물리학회 | - |
| dc.title | Study of ECR Plasma Etching Device | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 3 | - |
| dc.citation.beginningpage | 171 | - |
| dc.citation.publicationname | 한국응용물리학회지 | - |
| dc.contributor.localauthor | c. s. chang | - |
| dc.contributor.nonIdAuthor | sun-kyu song | - |
| dc.contributor.nonIdAuthor | hong-young chang | - |
| dc.contributor.nonIdAuthor | duk-in choi | - |
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