Browse "CH-Journal Papers(저널논문)" by Subject Block copolymer lithography
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| Fabrication of block copolymer templates by using dually responsive photoresist bottom layers Jung, Kyoung Ok; Bak, Chang Hong; Ku, Se-Jin; Kim, Jin-Baek, Reactive and Functional Polymers, v.118, pp.20 - 25, 2017-09 |
| Nanoporous hard etch masks using silicon-containing block copolymer thin films Ku, Se-Jin; Kim, Su-Min; Bak, Chang-Hong; Kim, Jin-Baek, POLYMER, v.52, no.1, pp.86 - 90, 2011-01 |
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