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Results 1-10 of 83 (Search time: 0.004 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Silicon Containing Bilayer Resist Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10 | |
| Synthesis of photoresist containing acetal protected B-keto acid group Kim, Jin-Baek; Kim, Kyung Sun, 한국고분자학회 2002년 추계학술대회 , v.27, no.2, pp.255 - 255, 한국고분자학회, 2002-10 | |
| Water-developable resists based on glyceryl methacrylate for 193-nm lithography Kim, Jin-Baek; Jang, Ji-Hyun; Choi, Jae-Hak; Lee, Kwan-Ku; Ko, Jong-Sung, Advances in Resist Technology and Processing XXI, v.5376, pp.616 - 624, 2004-02-23 | |
| Chemically amplified silicon-containing cycloaliphatic photoresists: their synthesis and application to 193-nm lithography Kim, Jin-Baek; Lee, Jae Jun; Lee, Kwan Gu, 한국고분자학회 2000년 춘계학술대회, v.25, no.1, pp.135 - 135, 한국고분자학회, 2000-04 | |
| Aryl ether dendron-functionalized aluminum tris(8-hydroxyquinoline)(AlQ3) Park, Ji Young; Kim, Jin-Baek, 한국고분자학회 2004년 추계 학술대회, pp.0 - 0, 한국고분자학회, 2004-10 | |
| Effects of florine for photoresists properties Kim, Young Woo; Kwon, Young-Gil; Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회, pp.254 - 254, 한국고분자학회, 2002-10 | |
| Synthesis and Evaluation of a Novel Alicyclic Polymer Having 7,7-Dimethyloxepan-2-one Acid Labile Group for 193-nm Photoresists Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회, pp.35 - 35, 한국고분자학회, 2001-10 | |
| New Class of Cholate-based Dissolution Inhibitor with Etch Resistance Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Jini; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회 , pp.176 - 176, 한국고분자학회, 2001-10 | |
| Molecular resists based on t-butyl cholate Derivatives for 193nm photoresists Oh, Tae-Hwan; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2002년 추계학술대회 , pp.254 - 254, 한국고분자학회, 2002-10 | |
| Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |