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Results 1-10 of 12 (Search time: 0.005 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Silicon Containing Bilayer Resist Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10 | |
| Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10 | |
| New Class of Cholate-based Dissolution Inhibitor with Etch Resistance Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Jini; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회 , pp.176 - 176, 한국고분자학회, 2001-10 | |
| Adhesion-promoted copolymers based on copolymers of norbornene derivatives and maleic anhydride for 193-nm photoresist Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.234 - 235, 한국고분자학회, 1999-10 | |
| Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04 | |
| The effects of functional group on cross-linking and shelf life of resists Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2000년 춘계학술대회, 한국고분자학회, 2000-04 | |
| Evaluation of Reactivity Ratios of Monomers in the Copolymerization of t-Butyl 3a-Methacryloyloxy-7a-Dihydroxy-5a-Cholan-24-oate and Maleic Anhydride Kim, Jin-Baek; Ko, Jong-Sung; Lee, Bum Wook; Yun, Hyo-Jin, 한국고분자학회 2000년 춘계학술대회 , pp.68 - 68, 한국고분자학회, 2000 | |
| Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, Journal of Photopolymer Science and Technology, pp.629 - 634, 2000-01 | |
| Chemically amplified resists based on the methacrylate polymers with cholic acid derivatives Kim, Jin-Baek; Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil, 한국고분자학회 2000년 춘계 학술대회, pp.42 - 42, 한국고분자학회, 2000 | |
| Chemically amplified resists based on methacrylate polymers with cholic acid derivatives Lee, Bum Wook; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2000년 춘계 학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |