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Results 481-489 of 489 (Search time: 0.005 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Design and Synthesis of High-Affinity Ligands for HIV Protease Inhibitors (Abstract) Lee, Hee Yoon; Ghosh, A.K.; Thompson, W.J.; Fitzgerald, P.M.D.; Culberson, C; Holloway, M.K; Mckee, S.P.; Munson, P.M; Duong, T.T.; Darke, P.L; Zugay, J.A.; Emini, E.A.; Schileif, W.A; Lin, J.H.; Chen, W.; Huff, J.R; Anderson, P.S., Abstracts of Papers of the American Chemical Society, pp.37 -, 1994 | |
| The Design and Synthesis of Orally Bioavailable HIV-1 Protease Inhibitors (Abstract) Lee, Hee Yoon; Huff, J.R; Vacca, J.P; Dorsey, B.D; Thompson, W.J; Ghosh, A. K; Hungate, R.W; Darke, P.L; Emini, E.A; Schleif, W.A; Lin, J.H; Chen, I.W; Holloway, M.K; Anderson, P.S., Journal of Cellular Biochemistry 1994, 1994 | |
| Chemically Amplified Resist based on the Norbornene Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group Kim, Jin-Baek; Kang, Jae-Sung, 한국고분자학회 1999년 춘계 학술대회 , pp.209 - 209, 한국고분자학회, 1999 | |
| Roles of the Protein Component on Transcription of the RNA Component of the RNse P in Escherichia coli (Proceeding) Lee, Younghoon; Yu, EJ; Jung,YH; Park, CU, Proc. Mol. Biol. & Genet., pp.41 - 42, 1994 | |
| Synthesis and properties of photorefractive polyimine with carbazole unit Woo H.Y.; Lee K.-S.; Shim, Hong Ku; Kim B.-K.; Rhee B.K., Xerographic Photoreceptors and Organic Photorefractic Materials IV, pp.142 - 151, SPIE, 1998-07-22 | |
| New dry-developable chemically amplified photoresist Kim, Jin-Baek; Kim, Hyun-Woo, Advances in Resist Technology and Processing XV, pp.786 - 793, SPIE, 1998-02-23 | |
| Group 4 Complexes Derived From o-Carborane: Catalytic and Luminescent Properties Hong, E; Han, Y; Lee, M. H; Jang, H; Do, Youngkyu, 10th International Conference of Boron Chemistry, International Conference of Boron Chemistry, 1999-07 | |
| Chemically Amplified Resists based on Acrylate Polymers containing Ketal Groups in the Side Chains Kim, Jin-Baek; Park, Jong-Jin; Jang, Ji-Hyun, SPIE-The International Society for Optical Engineering, pp.625 - 632, SPIE, 1999-01 | |
| Acid Diffusion and Evaporation in Chemically Amplified Resists Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, Advances in Resist Technology and Processing XV, pp.536 - 543, SPIE, 1999-03-15 |