Browse "CH-Conference Papers(학술회의논문)" by Author Lee, Kwan Gu
Showing results 1 to 3 of 3
| Chemically amplified silicon-containing cycloaliphatic photoresists: their synthesis and application to 193-nm lithography Kim, Jin-Baek; Lee, Jae Jun; Lee, Kwan Gu, 한국고분자학회 2000년 춘계학술대회, v.25, no.1, pp.135 - 135, 한국고분자학회, 2000-04 |
| Copolymers of methacrylates with cholic acid derivatives and anhydrides for 193-nm photoresists Ko, Jong Sung; Kim, Kyung Mi; Lee, Kwan Gu; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.156 - 156, 한국고분자학회, 2001-04-01 |
| Poly(3-allyl-7,7-dimethyl-oxepan-2-one-co-maleic anhydride) for a 193-nm photoresist Lee, Jae Jun; Lee, Kwan Gu; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.155 - 155, 한국고분자학회, 2001-04 |
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