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Copolymers of methacrylates with cholic acid derivatives and anhydrides for 193-nm photoresists

Ko, Jong Sung; Kim, Kyung Mi; Lee, Kwan Gu; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.156 - 156, 한국고분자학회, 2001-04-01

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