Showing results 1 to 2 of 2
Copolymers of methacrylates with cholic acid derivatives and anhydrides for 193-nm photoresists Ko, Jong Sung; Kim, Kyung Mi; Lee, Kwan Gu; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.156 - 156, 한국고분자학회, 2001-04-01 |
Molecular resists with adamantane core for 193-nm lithography Kim, Jin-Baek; Oh, Tae-Hwan; Kim, Kyung Mi, 대한화학회 2004년도 추계 학술회의, pp.0 - 0, 대한화학회, 2004-10 |
Discover