Browse "CH-Conference Papers(학술회의논문)" by Author Kim, Kyoung-Seon
Showing results 1 to 7 of 7
| Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27 |
| Photobleaching Deep UV Resists Based on Single Component Nonchemically Amplified Resist System Kim, Kyoung-Seon; Park, Ji Young; Kim, Sumin; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, 2006-02-12 |
| Synthesis of copolymers containing diazoketo groups and their application as DUV resists Kim, Jin-Baek; Kim, Kyoung-Seon, Advances in Resist Technology and Processing XXII, v.5753, pp.1057 - 1065, 2005-02-28 |
| Synthesis of copolymers containing diazoketo groups and their application as DUV resists Kim, Jin-Baek; Kim, Kyoung-Seon, Progr. Biomed. Opt. Imaging Proc. SPIE, v.5753, pp.1057 - 1065, SPIE, 2005 |
| Synthesis of norbornene copolymers with diazo groups and their application as DUV resists Kim, Jin-Baek; Kim, Kyoung-Seon, Advances in Resist Technology and Processing XX, pp.655 - 664, 2003-02-24 |
| Synthesis of Norbornene Copolymers with Diazo Groups AND their Application as Resist Kim, Jin-Baek; Kim, Kyoung-Seon, 한국고분자학회 2001년도 추계학술대회, pp.155 - 155, 한국고분자학회, 2001-10-01 |
| Synthesis of photobleachable deep UV resists based on single component nonchemically amplified resist system Kim, Kyoung-Seon; Kim, Sumin; Park, Jiyoung; Kim, Jin-Baek, Advances in Resist Technology and Processing XXIII, SPIE, 2006-02-20 |
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