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Results 1-10 of 29 (Search time: 0.004 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| THE EFFECT OF IN-SITU BORON DOPING ON THE STRAIN RELAXATION OF SI0.8GE0.2-B/SI HETEROSTRUCTURE GROWN BY MOLECULAR-BEAM EPITAXY LEE, SC; YUN, SJ; Lee, JeongYong, JOURNAL OF CRYSTAL GROWTH, v.150, no.1-4, pp.999 - 1004, 1995-05 | |
| A study on the residual stress measurement methods on chemical vapor deposition diamond films Kim, JG; Yu, Jin, JOURNAL OF MATERIALS RESEARCH, v.13, no.11, pp.3027 - 3033, 1998-11 | |
| EFFECTS OF F+ IMPLANTATION ON THE CHARACTERISTICS OF POLY-SI FILMS AND LOW-TEMPERATURE N-CH POLY-SI THIN-FILM TRANSISTORS PARK, JW; Ahn, Byung Tae; LEE, K, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.34, no.3, pp.1436 - 1441, 1995-03 | |
| Al-induced crystallization of an amorphous Si thin film in a polycrystalline Al/native SiO2/amorphous Si structure Kim, JH; Lee, JeongYong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.4A, pp.2052 - 2056, 1996-04 | |
| EFFECTS OF ANNEALING IN O-2 AND N-2 ON THE ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION Kim, IL; Kim, Jong-Seok; Kwon, Oh-Seung; Ahn, Sung-Tae; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF ELECTRONIC MATERIALS, v.24, no.10, pp.1435 - 1441, 1995-10 | |
| Effects of post annealing and oxidation processes on the removal of damage generated during the shallow trench etch process Lee, YJ; Hwang, SW; Oho, KH; Lee, JeongYong; Yeom, GY, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.12B, pp.6916 - 6921, 1998-12 | |
| Etch-induced damage in single crystal Si trench etching by planar inductively coupled Cl-2/N-2 and Cl-2/HBr plasmas Lee, JeongYong; Hwang, SW; Yeom, GY; Lee, JW; Lee, JY, THIN SOLID FILMS, v.341, no.1-2, pp.168 - 171, 1999-03 | |
| Intrinsic stress and its relaxation in diamond film deposited by hot filament chemical vapor deposition Choi, Si-Kyung; Jung, DY; Choi, HM, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.1, pp.165 - 169, 1996-01 | |
| Fabrication of excimer laser annealed poly-Si thin film transistor by using an elevated temperature ion shower doping Park, SC; Jeon, DukYoung, THIN SOLID FILMS, v.310, no.1-2, pp.317 - 321, 1997-11 | |
| FORMATION OF EPI-C49 TISI2/SI(111) BY SOLID-PHASE EPITAXIAL-GROWTH CHOI, CK; YANG, SJ; RYU, JY; Lee, JeongYong; LEE, YP; PARK, HH; LEE, EW; KIM, KH, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.26, no.2, pp.148 - 152, 1993-04 |