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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; No, Kwangsoo; Hwangbo, CK; Lim, SC; Woo, SG; Koh, YB, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.11, no.10, pp.1450 - 1455, 1996-10
2	Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography Jun, BH; Han, SS; Lee, JS; Kim, YB; Kang, HY; Koh, YB; Bae, Byeong-Soo; No, Kwangsoo, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.12, no.7, pp.921 - 926, 1997-07
3	Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography Jun, BH; Han, SS; Kim, KS; Lee, JS; Jiang, ZT; Bae, Byeong-Soo; No, Kwangsoo; Kim, DW; Kang, HY; Koh, YB, APPLIED OPTICS, v.36, no.7, pp.1482 - 1486, 1997-03
4	A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; No, Kwangsoo; Lim, SC; Woo, SG; Koh, YB, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.5, pp.2721 - 2727, 1996-09
5	Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; Lim, S; Woo, SG; Koh, YB; No, Kwangsoo, APPLIED SURFACE SCIENCE, v.113, pp.680 - 684, 1997-04

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