Browse "MS-Journal Papers(저널논문)" by Subject inductively coupled plasma
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| Effects of post annealing and oxidation processes on the removal of damage generated during the shallow trench etch process Lee, YJ; Hwang, SW; Oho, KH; Lee, JeongYong; Yeom, GY, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.12B, pp.6916 - 6921, 1998-12 |
| Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07 |
| Structure of SiO2 Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas Choi, Yong Woo; Ahn, Jin Hyung; Ahn, Byung Tae, ELECTRONIC MATERIALS LETTERS, v.1, no.2, pp.97 - 102, 2005-12 |
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