Showing results 1 to 5 of 5
Annealing of RuO2 and Ru bottom electrodes and its effects on the electrical properties of (Ba,Sr)TiO3 thin films Kim, Ho Gi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.37, no.1, pp.284 - 289, 1998 |
Electrochemical Evolution of Ru‐Based Polyoxometalates into Si,W‐Codoped RuO<i><sub>x</sub></i> for Acidic Overall Water Splitting Jeon, Dasom; Kim, Dong Yeon; Kim, Hyeongoo; Kim, Nayeong; Lee, Cheolmin; Seo, Dong-Hwa; Ryu, Jungki, ADVANCED MATERIALS, v.36, no.1, 2024-01 |
Oxygen diffusion through RuO2 bottom electrode of integrated ferroelectric capacitors Ahn, JH; Lee, WJ; Kim, Ho Gi, MATERIALS LETTERS, v.38, no.4, pp.250 - 253, 1999-02 |
Thermal stability of RuO2 thin films prepared by modified atomic layer deposition Kim, Jin-Hyock; Ahn, Ji-Hoon; Kang, Sang-Won; Roh, Jae-Sung; Kwon, Se-Hun; Kim, Ja-Yong, CURRENT APPLIED PHYSICS, v.12, pp.S160 - S163, 2012-09 |
반응성 스퍼터링법으로 형성시킨 PZT 커패시터의P-E 이력곡선의 이동현상 및 피로 특성 연구 김현호; 이원종, 전기전자재료학회논문지, v.18, no.11, pp.983 - 989, 2005-11 |
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