Showing results 1 to 3 of 3
Antireflection Behavior of Multidimensional Nanostructures Patterned Using a Conformable Elastomeric Phase Mask in a Single Exposure Step Park, Junyong; Yoon, Sanghoon; Kang, Kisuk; Jeon, Seokwoo, SMALL, v.6, no.18, pp.1981 - 1985, 2010-09 |
Electromigration Reliability of Barrierless Ruthenium and Molybdenum for Sub-10 nm Interconnection Kim, Jungkyun; Rhee, Hakseung; Son, Myeong Won; Park, Juseong; Kim, Gwangmin; Song, Hanchan; Kim, Geunwoo; et al, ACS APPLIED ELECTRONIC MATERIALS, v.5, no.5, pp.2447 - 2453, 2023-04 |
Wafer-Scale Synthesis of Highly Oriented 2D Topological Semimetal PtTe2 via Tellurization Choi, Minhyuk; Oh, Saeyoung; Hahn, Sungsoo; Ji, Yubin; Jo, Min-kyung; Kim, Jeongtae; Ju, Tae-Seong; et al, ACS Nano, v.18, no.23, pp.15154 - 15166, 2024-06 |
Discover