Browse "MS-Journal Papers(저널논문)" by Subject OPTICAL LITHOGRAPHY
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| Chromium aluminum oxide films for ArF line high transmittance attenuated phase shifting mask application Kim, E; Moon, SY; Kim, YH; Yoon, HS; No, Kwangsoo, OPTICAL ENGINEERING, v.39, no.11, pp.2947 - 2955, 2000-11 |
Directed self-assembly of block copolymers for next generation nanolithography Jeong, Seong-Jun; Kim, Ju Young; Kim, Bong Hoon; Moon, Hyoung-Seok; Kim, Sang Ouk, MATERIALS TODAY, v.16, no.12, pp.468 - 476, 2013-12 |
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